X-Ray Microscopy II

Proceedings of the International Symposium, Brookhaven, NY, August 31–September 4, 1987

455 Seiten, Taschenbuch

Kurzbeschreibung des Verlags

This volume is based on papers presented at the International Symposium on X-Ray Microscopy held at Brookhaven National Laboratory, Upton NY, August 31-September 4, 1987. Previous recent symposia on the sub ject were held in New York in 1979, Gottingen in 1983 and Taipei in 1986. Developments in x-ray microscopy continue at a rapid pace, with im portant advances in all major areas: x-ray sources, optics and components, and microscopes and imaging systems. Taken as a whole, the work pre sented here emphasizes three major directions: (a) improvements in the capability and image-quality of x-ray microscopy, expressed principally in systems attached to large, high-brightness x-ray sources; (b) greater access to x-ray microscopy, expressed chiefly in systems employing small, often pulsed, x-ray sources; and (c) increased rate of exploration of applications of x-ray microscopy. The number of papers presented at the symposium has roughly dou bled compared with that of its predecessors. While we are delighted at this growth as a manifestation of vitality and rapid growth of the field, we did have to ask the authors to limit the length of their papers and to submit them in camera-ready form. We thank the authors for their con tributions and for their efforts in adhering to the guidelines on manuscript preparation.

• Reihe: Springer Series in Optical Sciences
• Themen: Mathematik und Naturwissenschaften Physik Optische Physik Laserphysik
• ISBN: 9783662144909
• Sprache: Englisch
• Erscheinungsdatum: 03.10.2013
• Größe: 22.9 x 15.2 cm
• Verlag: Springer Berlin
• Herausgegeben von: David Sayre, Malcolm Howells, Janos Kirz, Harvey Rarback